Back KDC-10 Configurations and Images
 

KDC-10
The KDC-10 is a 1 cm Kaufman Ion Source from Kaufman and Robinson, Inc., the leaders in ion source technologies that has been especially modified and integrated for the IBS/e. The KDC-10 is a low energy, high current ion source that can ion process up to a two inch diameter sample. When used in the etch port of the IBS/e, SEM and optical microscopy samples can be polished and/or etched to enhance contrast in images. It is particularly useful for significantly improving the quality of EBSD patterns for difficult to prepare samples. With the neutralizer, the beam can be completely neutralized to prevent charging of the sample. The option of a focusing or collimated optics module gives the user the choice between higher sputter rates or larger processing area. When the ion source is used in a deposition port of the IBS/e, both very low rate depositions, required for High Resolution SEM imaging of non-conducting samples, and high rate depositions can be achieved, allowing more versatility for the instrument in a research environment as a desktop deposition system.
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Model IBS/e Ion Beam Sputter Deposition and Etching System – KDC-10 Configurations  
(Includes everything necessary to operate) Model #
Included Parts  
For the list of included parts except those for the high energy gun configuration descriptions, see the
IBS/e standard configurations for appropriate included parts.		 All
For model numbers with high energy gun configurations, see the IBS/e standard configurations for appropriate included parts. IBSe-KDC, IBS/e-KDCAUX
Replace 1” diameter Ir and C targets from IBS/e included parts with 2” diameter targets

IBS/e-KDCDUAL,  IBS/e-KDCDEPO
All systems with KRI KDC-10 system includes Smart Power Supply KSC1202, KDC10 Gridded filament ion source, Filament electron Neutralizer, Ion Optics Assembly (installed in ion source focusing is standard, specify other during ordering), operating cables, Spares and tools (filament neutralizer configuration), KDC-10 Instruction manual

All
Raised shielded Top Cover IBS/e-KDCDUAL, IBS/e-KDCDEPO
Second KDC10 Gridded filament ion source –Installed, Ion Source Relay Switchbox -Installed IBS/e-KDCDUAL
2” Diameter Target Holder Carousel and Shielding in Door

IBS/e-KDCDUAL, IBS/e-KDCDEPO
3” diameter graphite shield plate for target holder (used to shield window and minimize sputtered material from overspray ions)

IBS/e-KDC, IBS/e-KDCAUX, IBS/e-KDCETCH, IBS/e-KDCDUAL

KDC-10 Configurations and Images

   
 
 
Click Pics for Larger Image  
IBS/e-KDC IBS/e-KDC This configuration is the IBS/e with two high voltage ion guns in the two depo ports and the KDC-10 ion source in the etch/polish port. The system is integrated with the KRI power supply which is external to the IBS/e system. The system comes with the focusing optics unless otherwise specified. It is used for low rate deposition for high resolution SEM coatings and for ion etching, slope cutting, and ion polishing a sample in a large area with low energy ions or neutrals.
IBS/e-KDCAUX IBS/e-KDCAUX This configuration is the IBS/e with one high voltage ion gun in one of the depo ports and the KDC-10 ion source in the etch/polish port. The system is integrated with the KRI power supply which is external to the IBS/e system. The system comes with the focusing optics unless otherwise specified. It is used for low rate deposition for high resolution SEM coatings and for ion etching, slope cutting, and ion polishing a sample in a large area with low energy ions or neutrals. An auxiliary gas line is supplied for reactive ion sputtering.
IBS/e-KDCETCH IBS/e-KDCETCH This configuration is the IBS/e with the KDC-10 ion source in the etch/polish port. The high voltage guns and deposition capability are removed from this system. The ion source is used for ion polishing and ion etching of the sample. It is used for ion etching, slope cutting, and ion polishing a sample in a large area with low energy ions or neutrals. An optional auxiliary gas line is available for reactive ion etching applications.
IBS/e-KDCDEPO IBS/e-KDCDEPO This configuration is the IBS/e with the KDC-10 ion source in the upper depo port. The high voltage guns and power supply are removed from this system. The system is integrated with the KRI power supply which is external to the IBS/e system. This system is capable of depositing films at very low to very high rates. An auxiliary gas line is included for reactive sputter deposition capability.
IBS/e-KDCDUAL IBS/e-KDCDUAL This configuration is the IBS/e with one KDC-10 ion source in the upper depo port and another KDC-10 ion source in the etch/polish port. The high voltage guns and power supply are removed from this system. The system is integrated with the KRI power supply which is external to the IBS/e system. A switchbox is included in the system to switch power between the depo ion source and the etch ion source based on the IBS/e mode. An auxiliary gas line is added for reactive sputter deposition capability or reactive ion etching capability. The system is used for low to very high rate deposition metal or oxide coatings and for ion etching, slope cutting, and ion polishing a sample in a large area with low energy ions or neutrals.
Application Notes:  123, 125  
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